the
flux medium is designed to leave minimal, non-tacky, transparent
residue that does not need to be cleaned. The hydrophobic
nature minimises the impact of humidity in the atmosphere
on the chemistry.
NEXUS no
- clean
NX
9900i
no-clean,
pin testable, long tack and stencil life, closed system
approved, easily cleanable
residue, clear residue
SNX
9911
no-clean,
increased activity, long tack and stencil life,
closed system approved, RO/M1, clear residue
No
- clean
IF
9007'
stencil printing,
closed system approve, RE/L1
IF
9009lt
clear
residue, increased solderability, RE/L1
Lead
free
Delphine 5502
RE/L0,
resists long soak profiles,100% halide- free, easily cleanable residue
Delphine 5503
RE/L0,
easily cleanable, resists long soak profiles,increased tack
